A chemical spray pyrolysis technique was used to deposit a vanadium pentoxide (V2O5) thin films on glass substrate with a deposition temperature ranged from 300°C to 500°C in step of 50°C. From ammonium meta vanadate aqua precursor solution molarity of (0.1 M) was used as a source of vanadium. The effect of deposition temperature on structure, morphological, electrical conductivity and optical pro...
A chemical spray pyrolysis technique was used to deposit a vanadium pentoxide (V2O5) thin films on glass substrate with a deposition temperature ranged from 300°C to 500°C in step of 50°C. From ammonium meta vanadate aqua precursor solution molarity of (0.1 M) was used as a source of vanadium. The effect of deposition temperature on structure, morphological, electrical conductivity and optical pro...